學習主旨
Lesson Keynotes

> 商標製作之圓周運動.
Circular logo animation.

> 適當隱藏或顯示圓周圍繞運動之中心物件.
How to hide/show the center object of rotation.

> 必要之商標潤滑修飾
Smooth logo rotation moment.

> 商標隨指定軌道作動畫運作.
How to set logo to follow an animation track.

> 如何使商標隨軌道扭轉時, 作適當變形達到更生動之視覺效果.
How to morph the shape of a logo as it turns and twists along the animation track.

> Array快速複製之學習.
How to quickly duplicate using Array.

> 霧氣及風向配合之動畫特效設定.
Wind and Fog animation setup.

> 場景深度感之修飾.
Background depth modification.

> UVW貼圖修飾器的進階示範.
Advanced mapping modification using UVW map.

> 吞嚥, 吐出效果之物件變形設定.
Seed spewing effect and animation.

> 進階爆破, 利用分子系統產生厚度碎片.
Advanced explosion settings with shattered pieces particles.

> 物件之適當隱藏, 火焰之變化設定.
Correctly hiding objects and fire effect changes.

> 撞擊反彈設定, 摩擦系數, 地心引力之配合.
Object reflection, bouncing, friction, and gravity setup.

> 利用參考圖設計美軍MK50魚雷.
Using reference image to create the MK50 military torpedo.

> 氣泡產生, 氣泡材質設定及浮力配合.
Generating air bubbles, plus bubble material and floating animation.